发明名称 Silver halide photographic light-sensitive material
摘要 A silver halide photographic light-sensitive material having one or more layers including at least one light-sensitive silver halide emulsion layer on a support, wherein any of the layers formed on the support contains a compound represented by the following formula (1) and a fluorine-containing surfactant (in the formula (1), R<1 >represents an alkyl group or alkenyl group having 6-25 carbon atoms, ml represents an integer of 0-30, n<1 >represents an integer of 0-4, a represents 0 or 1, and Z' represents OSO3M or SO3M, where M represents a cation). There is provided a silver halide photographic light-sensitive material that shows superior antistatic property and can be stably produced.
申请公布号 US2004002024(A1) 申请公布日期 2004.01.01
申请号 US20030386556 申请日期 2003.03.13
申请人 YANAGI TERUKAZU;TSUKADA YOSHIHISA;YOKOTA KOUICHI;ICHIKAWA SHINICHI;KANAZAWA KATSUHIKO 发明人 YANAGI TERUKAZU;TSUKADA YOSHIHISA;YOKOTA KOUICHI;ICHIKAWA SHINICHI;KANAZAWA KATSUHIKO
分类号 G03C1/38;G03C1/89;(IPC1-7):G03C1/38;G03C1/85 主分类号 G03C1/38
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