发明名称 Process for creating holes in polymeric substrates
摘要 Provided is a process for creating a via through a substrate including the steps of (a) providing a substantially void-free film of a curable composition; (b) applying a resist onto the curable film; (c) imaging the resist in predetermined locations; (d) developing the resist to expose predetermined areas of the curable film; (e) removing the exposed areas of the curable film to form holes through the curable film; and (f) heating the curable film of step (e) to a temperature and for a time sufficient to cure the curable composition. Also disclosed is a process of fabricating a circuit assembly which includes building patterned circuit layers upon a substrate that has vias provided by the aformentioned process.
申请公布号 US2004000426(A1) 申请公布日期 2004.01.01
申请号 US20020183674 申请日期 2002.06.27
申请人 OLSON KEVIN C.;WANG ALAN E. 发明人 OLSON KEVIN C.;WANG ALAN E.
分类号 H05K3/42;H05K3/00;H05K3/46;(IPC1-7):H05K1/03;B21B1/00;B21C27/00;B21D28/00;B32B3/10;G03F7/20;G03F7/30;G03F7/40;H01R12/04;H05K1/09;H05K1/11 主分类号 H05K3/42
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