发明名称 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
摘要 |
Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The coatings can protect substrates from physical and/or chemical attack.
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申请公布号 |
US2004002221(A1) |
申请公布日期 |
2004.01.01 |
申请号 |
US20020180504 |
申请日期 |
2002.06.27 |
申请人 |
O'DONNELL ROBERT J.;DAUGHERTY JOHN E. |
发明人 |
O'DONNELL ROBERT J.;DAUGHERTY JOHN E. |
分类号 |
H05H1/46;C23C16/44;H01J37/32;H01L21/3065;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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