| 摘要 |
An apparatus for washing quartz parts, particularly for process equipment used in semiconductor industries, comprising a process unit that is suitable to perform washing, a unit for managing washing and rinsing fluids, and a control unit, the units being mutually separate, the process unit comprising a bell-shaped element that is suitable to enclose hermetically the quartz parts to be washed, the quartz parts being inserted vertically in the bell-shaped element.
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