| 摘要 |
PURPOSE: A rinsing device for an LCD fabricating apparatus is provided to monitor a contact angle between substrates and a rinsing line continuously by radiating excimer UV, thereby improving the rinsing reject rate caused by the problems in the excimer UV radiation performance. CONSTITUTION: A rinsing device for an LCD fabricating apparatus includes a contact angle measuring unit(33) mounted on a lower conveyor(32) of a buffer part(3) for measuring a contact angle of a substrate(5) with respect to a predetermined position of the substrate. As the substrate is aligned in a light radiation part(1), excimer UV is radiated onto the substrate for 17seconds by an interval of 2.1mm and breaks the binding between organic substances on the substrate. After the substrate is discharged to the lower conveyor, the substrate is stopped at a position corresponding to the contact angle measuring unit. The contact angle measuring unit drops a water drop onto a predetermined position of the stopped substrate for determining whether the excimer UV is properly radiated by the spreading of the water drop. |
