MULTI DIRECTIONAL MECHANICAL SCANNING IN AN ION IMPLANTER
摘要
An end station for an ion implanter has a vacuum chamber which receives an ion beam. The wafer holder is mounted at the distal end of a scanning arm which has its proximal end attached to the chamber wall. The scanning arm has at least two rotary joints providing articulation of the arm to permit movement of the wafer holder in two orthogonal scan directions in a scan plane transverse to the beam path through the vacuum chamber. A scanning arm driver moves the substrate holder in the scan plane in a desired two-dimensional scan pattern relative to the beam path.
申请公布号
WO2004001789(A2)
申请公布日期
2003.12.31
申请号
WO2003GB02691
申请日期
2003.06.20
申请人
APPLIED MATERIALS, INC.;NAYLOR-SMITH, RICHARD;DILLON, SIMON, FREDERICK;COOKE, RICHARD
发明人
NAYLOR-SMITH, RICHARD;DILLON, SIMON, FREDERICK;COOKE, RICHARD