| 摘要 |
PURPOSE: Provided is a gas scrubber to remove dust and fine particles contained in a waste gas generated from a semiconductor device fabrication plant. CONSTITUTION: The gas scrubber comprises a clean water tank(8); a plurality of venturi tubes(5) with respective branch tubes(6) at an upper portion and a plurality of nozzles through which the clean water, hot water and nitrogen gas are introduced thereinto; the venturi tubes(5) being arranged above the clean tank(8) and connected to the clean water tank(8) by respective pipes(7); a plurality of waste gas supplying tubes(3) coupled to the corresponding branch tubes(6) for supplying waste gas to the venturi tubes(5) through valves (V1)(V2); a powder removing device(20) for removing powder contained in the waste gas by spraying hot water into the venturi tubes(5) through the nozzles; a nitrogen gas supplying tube for supplying nitrogen gas into the venturi tubes(5) for diluting and cooling the waste gas; a plurality of spray purification tanks(40) installed above the clean water tank(8), coupled to each other, and having respective pads which can be replaced and nozzles at an upper portion to spray clean water(9) thereinto for removing powder; and a waste gas outlet tube(48) coupled to one of the purification tank(40).
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