PHOTO LITHOGRAPHY EQUIPMENT FOR SEMICONDUCTOR MANUFACTURING

摘要

PURPOSE: Photo lithography equipment for semiconductor manufacturing is provided to be capable of preventing the generation of pattern failure, by detecting the identification number of a wafer from a spinner for previously checking wafer information before transferring the wafer to a stepper. CONSTITUTION: A photo lithography equipment for semiconductor manufacturing is provided with a spinner(11) for coating and developing a predetermined layer at the upper portion of a wafer and a stepper(13) for forming a pattern by exposing the wafer completed with the coating and developing process in the spinner. The photo lithography equipment for semiconductor manufacturing further includes a pre-alignment unit(15) installed between the spinner and the stepper for aligning the flat zone of the wafer and a CCD(Charge Coupled Device) camera(16) installed at the upper portion of the pre-alignment unit for detecting the identification number of the wafer aligned by the pre-alignment unit.