| 摘要 |
The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve. <IMAGE>
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