| 摘要 |
PURPOSE: A flat display device and a method for manufacturing the same are provided to simplify manufacturing procedures and achieve improved transmission efficiency, while preventing damages of a source/drain electrode. CONSTITUTION: A method for manufacturing a flat display device comprises a step of forming semiconductor layers(321,323,325) on an insulating substrate(300); a step of forming a gate insulating film(330) on the insulating substrate; a step of forming a gate electrode on the portion of the gate insulating film corresponding to the semiconductor layers; a step of forming source/drain doping areas(353,355) on the semiconductor layers by using the gate electrode as a mask; a step of forming a pixel electrode by using a half-tone mask; a step of forming an inter-layer insulating film on the insulating substrate; a step of forming a contact hole for exposing the source/drain doping areas and exposing the pixel electrode by etching the inter-layer insulating film; a step of forming a source/drain electrode which is connected to the source/drain doping areas through the contact hole and directly contacts the exposed pixel electrode; and a step of forming a planarizing film having an aperture for partially exposing the pixel electrode.
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