发明名称 Single electron memory device comprising quantum dots between gate electrode and single electron storage element and method for manufacturing the same
摘要 A single electron memory device including quantum dots between a gate electrode and a single electron storage element and a method for manufacturing the same, wherein the single electron memory device includes a substrate on which a nano-scale channel region is formed between a source and a drain, and a gate lamination pattern including quantum dots on the channel region. The gate lamination pattern includes a lower layer formed on the channel region, a single electron storage medium storing a single electron tunneling through the lower layer formed on the lower layer, an upper layer including quantum dots formed on the single electron storage medium, and a gate electrode formed on the upper layer to be in contact with the quantum dots.
申请公布号 US6670670(B2) 申请公布日期 2003.12.30
申请号 US20020125597 申请日期 2002.04.19
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 CHAE SOO-DOO;KIM BYONG-MAN;KIM MOON-KYUNG;CHAE HEE-SOON;RYU WON-IL
分类号 G11C16/04;H01L21/28;H01L21/8247;H01L27/10;H01L29/788;H01L29/792;(IPC1-7):H01L29/788 主分类号 G11C16/04
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