| 摘要 |
A geometrical correction system and method comprising creation of at least one pattern consisting of asymmetric two dimensional waves, embedding at least one pattern consisting of asymmetric two dimensional waves in a real domain, and calculation of at least one geometrical transformation applied by way of extraction of the embedded two dimensional waves. Said creation of at least one pattern consisting of asymmetric two dimensional waves means to calculate a two dimensional wave parameter set for creating at least one pattern adapted for use in the geometrical correction system of this invention. Also, said embedding of at least one pattern consisting of asymmetric two dimensional waves in a real domain means to add the pattern to an original image. Further, said calculation of at least one geometrical transformation applied by way of extraction of the embedded two dimensional waves means to calculate parameters of the embedded two dimensional waves from the image that is subjected to at least one geometrical transformation, to compare these parameters with the two dimensional wave parameter set of the embedded pattern, thereby to identify the geometrical transformation applied to the embedded image.
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