发明名称 Balanced positioning system for use in lithographic apparatus
摘要 A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
申请公布号 US6671036(B2) 申请公布日期 2003.12.30
申请号 US20020209926 申请日期 2002.08.02
申请人 ASML NETHERLANDS B.V. 发明人 KWAN YIM BUN P.
分类号 G03F7/22;F16F15/02;G03F7/20;G03F9/00;H01L21/027;H01L21/68;H05K3/00;(IPC1-7):G03B27/58;G03B27/42;G03B27/62;G21K5/00 主分类号 G03F7/22
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