| 发明名称 |
Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide |
| 摘要 |
A method of cleaning a microelectronic substrate is carried out by providing a cleaning fluid, the cleaning fluid comprising an adduct of hydrogen fluoride with a Lewis base in a carbon dioxide solvent; and then cleaning the substrate by contacting the substrate to the cleaning fluid for a time sufficient to clean the substrate.
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| 申请公布号 |
US6669785(B2) |
申请公布日期 |
2003.12.30 |
| 申请号 |
US20020146617 |
申请日期 |
2002.05.15 |
| 申请人 |
MICELL TECHNOLOGIES, INC. |
发明人 |
DEYOUNG JAMES P.;GROSS STEPHEN M.;WAGNER MARK I.;MCCLAIN JAMES B. |
| 分类号 |
H01L21/308;B08B7/00;C11D7/02;C11D7/08;C11D11/00;H01L21/304;H01L21/311;(IPC1-7):C23G1/02 |
主分类号 |
H01L21/308 |
| 代理机构 |
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