发明名称 Semiconductor device and method of manufacturing the same
摘要 There is provided a structure of a pixel TFT (n-channel type TFT) in which an off current value is sufficiently low. In impurity regions, a concentration distribution of an impurity element imparting one conductivity type is made to have a concentration gradient, the concentration is made low at a side of a channel formation region, and the concentration is made high at the side of an end portion of a semiconductor layer.
申请公布号 US2003234424(A1) 申请公布日期 2003.12.25
申请号 US20030413985 申请日期 2003.04.15
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 SUZAWA HIDEOMI;TSUNODA AKIRA
分类号 G02F1/136;G02F1/1362;G02F1/1368;G09F9/30;H01L21/336;H01L21/77;H01L27/11;H01L27/12;H01L29/786;(IPC1-7):H01L21/00;H01L27/01;H01L31/039 主分类号 G02F1/136
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