发明名称 |
Adaptive optic off-axis metrology |
摘要 |
A metrology source and sensor arrangement are placed off-axis adjacent to and preferably coplanar with a reticle and target, respectively in a catoptic optical system suitable for EUV imaging. On-axis aberrations are derived by modelling of the optical system from off-axis metrology output. Adaptive optical elements are employed to minimize aberrations at acceptable levels for high precision and resolution exposures such as lithographic patterning.
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申请公布号 |
US2003234993(A1) |
申请公布日期 |
2003.12.25 |
申请号 |
US20030457436 |
申请日期 |
2003.06.10 |
申请人 |
HAZELTON ANDREW J.;PHILLIPS ALTON H. |
发明人 |
HAZELTON ANDREW J.;PHILLIPS ALTON H. |
分类号 |
G03F7/20;(IPC1-7):G02B5/08;G02B7/182 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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