发明名称 |
Non-corrosive cleaning compositions for removing etch residues |
摘要 |
A non-corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water; and (b) a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid. Preferably, the at least one carboxylic acid has a pKa value ranging from 3 to 6. Also, a method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue; and (b) contacting the substrate with a cleaning composition comprising water; and a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid.
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申请公布号 |
US2003235996(A1) |
申请公布日期 |
2003.12.25 |
申请号 |
US20030421506 |
申请日期 |
2003.04.24 |
申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
LEON VINCENT G.;ELDERKIN MICHELLE;FERREIRA LAWRENCE |
分类号 |
B08B3/08;C09K13/00;C11D7/26;C11D7/28;C11D7/32;C11D7/34;C11D11/00;G03F7/42;H01L21/02;H01L21/304;(IPC1-7):C23G1/02;F23J1/00;B08B7/00;H01L21/302;H01L21/461 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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