发明名称 |
Antireflective coatings for high-resolution photolithographic synthesis of DNA array |
摘要 |
The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support; derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
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申请公布号 |
US2003235824(A1) |
申请公布日期 |
2003.12.25 |
申请号 |
US20020177169 |
申请日期 |
2002.06.20 |
申请人 |
AFFYMETRIX, INC. |
发明人 |
TRULSON MARK;MCGALL GLENN H.;SYWE BEI-SHEN;KAJISA LISA T.;TRUONG DANA |
分类号 |
G01N33/53;B01J19/00;C12M1/00;C12N15/09;C12Q1/68;C40B40/06;G01N37/00;G03F7/09;(IPC1-7):C12Q1/68;C12M1/34;G01N33/543;B05D3/00 |
主分类号 |
G01N33/53 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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