发明名称 Antireflective coatings for high-resolution photolithographic synthesis of DNA array
摘要 The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support; derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
申请公布号 US2003235824(A1) 申请公布日期 2003.12.25
申请号 US20020177169 申请日期 2002.06.20
申请人 AFFYMETRIX, INC. 发明人 TRULSON MARK;MCGALL GLENN H.;SYWE BEI-SHEN;KAJISA LISA T.;TRUONG DANA
分类号 G01N33/53;B01J19/00;C12M1/00;C12N15/09;C12Q1/68;C40B40/06;G01N37/00;G03F7/09;(IPC1-7):C12Q1/68;C12M1/34;G01N33/543;B05D3/00 主分类号 G01N33/53
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