| 摘要 |
Provided are a method and an apparatus to reduce/detect a presence of a gas in fluids employed in semiconductor manufacturing processes. One embodiment of the invention includes creating a flow of cleaning fluids and impinging electromagnetic radiation upon a region of the flow. The electromagnetic radiation is sensitive to phase state changes in the flow, i.e., changes between liquid and gas, so that air bubbles in the liquid flow may be detected. The electromagnetic radiation is sensed and a signal is produced in response to phase state changes in the flow. The flow of the cleaning fluid is terminated in response to the signal. In accordance with another embodiment a system is provided that operates in accordance with the method.
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