发明名称 Positive resist composition
摘要 The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator, and multifunctional epoxy compound, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
申请公布号 US2003236351(A1) 申请公布日期 2003.12.25
申请号 US20030404671 申请日期 2003.04.02
申请人 TOISHI KOUJI;MIYA YOSHIKO;UETANI YASUNORI 发明人 TOISHI KOUJI;MIYA YOSHIKO;UETANI YASUNORI
分类号 C08F8/44;G03F7/004;G03F7/039;(IPC1-7):C08F8/00 主分类号 C08F8/44
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