Systems and methods for generating an artwork representation according to a circuit fabrication process

摘要

In one embodiment, the present invention relates to a system for generating an artwork representation according to a circuit fabrication process. The system comprises a cell library that stores at least dimensional information associated with a plurality of circuit cells, wherein each of the plurality of circuit cells is defined by a sub-mask for a respective logical device according to the circuit fabrication process; an instance placement engine that generates a circuit layout that is defined by at least a specification file specifying an arrangement of logical devices and the cell library; and an artwork generator that generates an artwork representation that defines a mask for etching of the generated circuit layout according to the circuit fabrication process.