发明名称 |
Polierkissen und Poliervorrichtung |
摘要 |
A window member (11) having an intentionally designed distribution of refractive index is used, as a transparent window member in a light transmission area of a polishing pad for detecting the end point of polishing by a CMP method.This window member (11) has areas (11a) having a high refractive index and areas (11b) having a low refractive index in its window face. In a cross section normal to the window face, the high-refractive index areas (11a) and the low-refractive index areas (11b) are alternately arranged in stripes. These areas (11a and 11b) in the window face are in a Fresnel zone plate arrangement in which the first area (center circle) is a bright one (area having a high refractive index). A plurality of such Fresnel zone plates (F) are arrayed in a matrix in the window face of the window member (11). |
申请公布号 |
DE10084915(C2) |
申请公布日期 |
2003.12.24 |
申请号 |
DE2000184915 |
申请日期 |
2000.08.25 |
申请人 |
ASAHI KASEI KABUSHIKI KAISHA, OSAKA |
发明人 |
KOIKE, HISAO;ARAI, TAKESHI;IKEDA, AKIHIKO |
分类号 |
B24B37/013;B24B37/04;B24B37/20;B24B37/24;B24B49/04;B24B49/12;B24D7/12;B24D13/12;B24D13/14;(IPC1-7):B24D13/00 |
主分类号 |
B24B37/013 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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