AN IMPROVED SUBSTRATE HOLDER FOR PLASMA PROCESSING

摘要

An improved substrate holder (100) comprises an electrode (110) supporting a focus ring (118) and a substrate (122), an insulating member (114) surrounding the electrode (110) and focus ring (118), a ground member (114) surrounding the insulating member (112), and a focus ring surrounding the substrate. The focus ring provides a RF impedance substantially equivalent to a RF impedance of the substrate. A method of processing a substrate utilizing the improved substrate holder reduces arcing between the edge of the substrate and the focus ring.