发明名称 N-TYPE SEMICONDUCTOR DIAMOND PRODUCING METHOD AND SEMICONDUCTOR DIAMOND
摘要 An n-type semiconductor diamond producing method, an n-type semiconductor diamond, pn-junction semiconductor diamond, a pnp-junction semiconductor diamond, an npn-junction semiconductor diamond, and a pin-junction are provided. A diamond {100} single-crystal substrate (10) is processed to form a diamond {111} surface. A diamond is epitaxially grown while the diamond {111} surface is being doped with an n-type dopant to form an n-type diamond epitaxial layer (20). Combining a thus produced n-type semiconductor diamond, a p-type semiconductor diamond, and a non-doped diamond, and using a p-type semiconductor diamond {100} single-crystal substrate, a pn-junction semiconductor diamond, a pnp-junction semiconductor diamond, an npn-junction semiconductor diamond, and a pin-junction semiconductor diamond are produced.
申请公布号 WO03106743(A1) 申请公布日期 2003.12.24
申请号 WO2003JP07717 申请日期 2003.06.18
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;NAMBA, AKIHIKO;IMAI, TAKAHIRO;NISHIBAYASHI, YOSHIKI 发明人 NAMBA, AKIHIKO;IMAI, TAKAHIRO;NISHIBAYASHI, YOSHIKI
分类号 C30B25/02;C30B29/04;H01L21/04;H01L21/20;H01L21/205;H01L21/44;(IPC1-7):C30B29/04 主分类号 C30B25/02
代理机构 代理人
主权项
地址