PLANE-PARALLEL STRUCTURES OF SILICON/SILICON OXIDE

摘要

The present invention relates to plane-parallel structures of silicon/silico n oxide (silicon/silicon oxide flakes), obtainable by heating plane-parallel structures of SiOy in an oxygen-free atmosphere at a temperature above 400 ~ C, wherein 0.70 <= y <= 1.8, or plane-parallel structures of silicon/sili con oxide, obtainable by heating plane-parallel structures of SiOx in an oxygen- free atmosphere at a temperature above 400 ~C, wherein 0.03 <= x <= 0. 95, a process for their production and their use for the production of interferenc e pigments.