THIN FILM-FORMING APPARATUS

摘要

A thin film-forming apparatus where raw material gas is uniformly supplied on a substrate surface and the thickness of an organic thin film can be uniformly formed on the substrate surface. The thin film-forming apparatus comprises a vacuum chamber (11), a substrate holder (12) provided in the vacuum chamber (11), and a gas supply end (22) for supplying gas to a substrate mounting face (12a) of the substrate holder (12). The apparatus is characterized in that the gas supply end (22) is formed such that the raw material gas is supplied to the substrate mounting face (12a) in an elongate shape.