发明名称 APPARATUS AND METHOD FOR CONTROLLING PRESSURE OF CHAMBER
摘要 PURPOSE: An apparatus and a method for controlling the pressure of a chamber are provided to be capable of preventing the malfunction of a pump due to the overload applied to the pump while carrying out a predetermined process requiring high process pressure. CONSTITUTION: An apparatus for controlling the pressure of a chamber(100) is provided with the first pump(220) for controlling the pressure of the chamber, a motor(300) for driving the first pump, and a motor RPM(Revolution Per Minute) changing part for preventing overload from being applied to the first pump. Preferably, the motor RPM changing part includes an ammeter(510) for measuring the value of the current supplied to the motor and a controller(400) for changing the RPM of the motor according to the current value.
申请公布号 KR20030095631(A) 申请公布日期 2003.12.24
申请号 KR20020032920 申请日期 2002.06.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, JONG HO;HAN, SEONG IL
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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