| 摘要 |
<p>A technique is provided to define a pattern (100) on a substrate (70) that includes a dense region with a number of features (102) and an isolated feature region comprised of at least a part of one of the features (101). The dense feature region has a greater feature density than the isolated feature region. A reference feature (103) is measured at a number of different points relative to the isolated feature region and the dense feature region with a measurement tool (75). An iso-dense effect is determined from these measurements.</p> |
