发明名称 Liquid etchant and method for roughening copper surface
摘要 A liquid etchant and a method for roughening a copper surface each capable of providing copper with a roughened surface increased in acid resistance regardless of a chlorine ion in a short period of time, to thereby ensure firm adhesion between a copper conductive pattern and an outer layer material during manufacturing of a printed circuit board, resulting in the manufacturing being highly simplified. The liquid etchant includes a main component containing an oxo acid such as sulfuric acid and a peroxide such as hydrogen peroxide. Also, the liquid etchant includes an auxiliary component containing a tetrazole such as 5-aminotetrazole or the like, or a 1,2,3-azole. The liquid etchant permits a copper surface to be roughened in an acicular manner.
申请公布号 US6666987(B1) 申请公布日期 2003.12.23
申请号 US19990327800 申请日期 1999.06.08
申请人 EBARA DENSAN LTD. 发明人 MORIKAWA YOSHIHIKO;SENBIKI KAZUNORI;YAMAZAKI NOBUHIRO
分类号 H05K3/06;A62C2/00;A62D1/00;B41N3/03;C23F1/14;C23F1/18;C23G1/00;H05K3/38;H05K3/46;(IPC1-7):C09K13/06 主分类号 H05K3/06
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