| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a system for treating a substrate in which uneven treatment is suppressed in the surface of the substrate. SOLUTION: At a throw-in section 11, carry rollers R are rotary driven through a motor M1 to carry a substrate. Similarly, carry rollers R are rotary driven through motors M2 -M4 at a prewet section 13, a shower developing section 15 and a liquid cutting section 17, to carry the substrate. Furthermore, carry rollers R are rotary driven through motors M6 -M8 at first through third water washing sections 31, 35, 37, through a motor M9 at a substrate carrying chamber 51, and through a motor M10 at an air knife section 53 to carry the substrate. Operation at the motors M1 -M10 is controlled at a control section. According to the arrangement, the substrate can be carried at high speed at the time of starting/ending the treatment and starting/ending the water washing and uneven treatment or water washing can be prevented at each part of the substrate. |
