发明名称 FACE MASK AND METHOD OF MANUFACTURING THE SAME
摘要 A mask includes a filter layer (12) and a support base (14) supporting the filter layer. The filter layer has first and second complimentary portions that together form a rim (20), where the first portion is connected to the second portion at first and second seams (32A, 32B). The first seam (32A) extends from the rim (20) to a first pleat (30A), while the second seam (32B) extends from the rim (20) to a second pleat (30B). The first pleat (30A) is connected to the second pleat by an unpleated central portion (34). The first pleat, second pleat and unpleated central portion are formed by the first and second portions (24, 26) of the filter layer.
申请公布号 WO03103425(A1) 申请公布日期 2003.12.18
申请号 WO2003US13052 申请日期 2003.04.25
申请人 LOUIS M. GERSON CO., INC. 发明人 BRUNELL, ROBERT, A.;SNOW, GEORGE, A.
分类号 A41D13/11;(IPC1-7):A41D13/11 主分类号 A41D13/11
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