| 摘要 |
PURPOSE: A wafer transfer apparatus of a semiconductor manufacturing equipment is provided to be capable of preventing the damage of a wafer when the wafer is deviated from a predetermined position, by removing the wafer after venting a transfer chamber through a vent hole. CONSTITUTION: A wafer transfer apparatus of a semiconductor manufacturing equipment is provided with an N2 gas supply part(30) for supplying N2 gas, a pressure control part(28) for controlling the pressure of the N2 gas supplied from the N2 gas supply part, the first passive valve(34) for passively switching a vent line, and the first vent valve(24) connected with the first vent hole of a transfer chamber and the first passive valve. The wafer transfer apparatus further includes the second vent hole(32) for venting the transfer chamber using the N2 gas for removing a wafer deviated from a predetermined position, and the second vent valve(36) connected with the second vent hole of the transfer chamber and the second passive valve(38).
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