| 摘要 |
<p>A method for forming an organic thin film of uniform quality in a substrate surface without heating the film forming surface. A gas (film forming component gas) (g2) is produced by vaporizing a single film-forming component of an organic material and transported and supplied into a processing chamber (11) where a substrate (W) is placed. The organic material holding the film-forming component is deposited on the substrate (W) in the processing chamber (11) to form an organic thin film. During the deposition of the organic material, the substrate (W) is kept cooled. The film-forming component gas (g2) is transported and supplied into the processing chamber (11) by a carrier gas such as an inert gas (g1). By repeating such deposition of an organic material, a multilayer of organic thin films of different film-forming materials is formed.</p> |
