发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 To provide a semiconductor device having copper wiring layers and organic insulating resin layers with less separation and its manufacture method. A semiconductor device has: a semiconductor substrate formed with a number of semiconductor elements; a first interlayer insulating film formed above the semiconductor substrate and having a first wiring recess; a first copper wiring embedded in the first wiring recess; a second interlayer insulating film having a second wiring recess, the second interlayer insulating film including a copper diffusion preventing layer formed on the first copper wiring and the first interlayer insulating film, an oxide film formed on the copper diffusion preventing layer, and an organic insulating resin layer formed on the oxide film; and a second copper wiring embedded in the second wiring recess.
申请公布号 KR20030095205(A) 申请公布日期 2003.12.18
申请号 KR20030009611 申请日期 2003.02.15
申请人 发明人
分类号 H01L21/3205;H01L21/768;H01L23/52;H01L23/522;H01L23/532 主分类号 H01L21/3205
代理机构 代理人
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