VARIABLE TEMPERATURE PROCESSES FOR TUNABLE ELECTROSTATIC CHUCK
摘要
An etch processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor reporting a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the temperature control system to maintain the temperature of the chuck at a selectable setpoint temperature. A first setpoint temperature and a second setpoint temperature are selected. The wafer is placed on the chuck and set to the first setpoint temperature. The wafer is then processed for a first period of time at the first setpoint temperature and for a second period of time at the second setpoint temperature.
申请公布号
WO03085721(A3)
申请公布日期
2003.12.18
申请号
WO2003US09153
申请日期
2003.03.25
申请人
LAM RESEARCH CORPORATION;KAMP, TOM, A.;GOTTSCHO, RICHARD;LEE, STEVE;LEE, CHRIS;YAMAGUCHI, YOKO;VAHEDI, VAHID;EPPLER, AARON
发明人
KAMP, TOM, A.;GOTTSCHO, RICHARD;LEE, STEVE;LEE, CHRIS;YAMAGUCHI, YOKO;VAHEDI, VAHID;EPPLER, AARON