| 摘要 |
The present invention relates to a method and an apparatus for preparing polysilicon, more specifically to a method and an apparatus for preparing polysilicon in granule form by equipping a fluidized bed reactor with a nozzle that provides an etching gas including hydrogen chloride in order to effectively prevent silicon from depositing on the outlet surfaces of the reaction gas supplying means and to be able to operate the reactor continuously in the bulk production of polysilicon granules.
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