Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for manufacturing device

摘要

A near-field light exposure mask provided with a plurality of apertures each having a width small than the wavelength of light used for exposure. In the mask described above, among the plurality of apertures, apertures adjacent to each other are disposed at a necessary distance so that near-field light effused from one of the apertures adjacent to each other does not overlap that generated from the other aperture.