发明名称 Vertical nano-size transistor using carbon nanotubes and manufacturing method thereof
摘要 The present invention provide a vertical nano-sized transistor using carbon nanotubes capable of achieving high-density integration, that is, tera-bit scale integration, and a manufacturing method thereof, wherein in the vertical nano-sized transistor using carbon nanotubes, holes having diameters of several nanometers are formed in an insulating layer and are spaced at intervals of several nanometers. Carbon nanotubes are vertically aligned in the nano-sized holes by chemical vapor deposition, electrophoresis or mechanical compression to be used as channels. A gate is formed in the vicinity of the carbon nanotubes using an ordinary semiconductor manufacturing method, and then a source and a drain are formed at lower and upper parts of each of the carbon nanotubes thereby fabricating the vertical nano-sized transistor having an electrically switching characteristic.
申请公布号 US2003230760(A1) 申请公布日期 2003.12.18
申请号 US20030388450 申请日期 2003.03.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI WON-BONG;LEE JO-WON;LEE YOUNG-HEE
分类号 B82B1/00;B82B3/00;C23C16/26;G11C13/02;H01L21/335;H01L21/336;H01L21/8234;H01L29/06;H01L29/732;H01L29/74;H01L29/76;H01L29/775;H01L29/78;H01L29/786;H01L35/24;H01L51/30;(IPC1-7):H01L31/032;H01L31/033;H01L31/072;H01L31/109 主分类号 B82B1/00
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