| 发明名称 |
Photoacid-labile polymers and photoresists comprising same |
| 摘要 |
The present invention relates to new polymers that contain photoacid-labile groups that comprise arylalkyl groups. Particularly preferred are polymers having a benzylic carbon directly linked to an ester oxygen. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
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| 申请公布号 |
US2003232274(A1) |
申请公布日期 |
2003.12.18 |
| 申请号 |
US20020327450 |
申请日期 |
2002.12.20 |
| 申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
BARCLAY GEORGE G.;BOLTON PATRICK J. |
| 分类号 |
G03F7/039;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/039 |
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