发明名称 |
PHOTOMASK AND METHOD FOR REPAIRING DEFECTS |
摘要 |
A photomask and method for repairing defects on the same are disclosed. The photomask preferably includes a substrate, a buffer layer and a nontransmissive layer with the buffer layer disposed between the substrate and the nontransmissive layer. The method includes forming a pattern in the nontransmissive layer. If one or more defects are identified in the patterned nontransmissive layer, the buffer layer protects the substrate from damage when defects in the patterned nontransmissive layer are repaired. |
申请公布号 |
WO03104896(A2) |
申请公布日期 |
2003.12.18 |
申请号 |
WO2003US18106 |
申请日期 |
2003.06.09 |
申请人 |
DUPONT PHOTOMASKS, INC. |
发明人 |
DIEU, LAURENT;LAMANTIA, MATTHEW, J. |
分类号 |
G03F1/00;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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