APPARATUS FOR COATING PHOTORESIST LAYER

摘要

PURPOSE: An apparatus for coating a photoresist layer is provided to prevent a coating defect by maintaining the amount of the photoresist layer discharged from the nozzles constant. CONSTITUTION: A chuck(10) supports and rotates a wafer(1). A spin driving unit rotates a vertical axis(20) connected to the chuck to rotate the chuck. The wafer is coated with the photoresist layer discharged from the nozzles(40). A motor-driving-type pumping apparatus(150) including an on-off suckback valve(153) supplies the photoresist layer in a photoresist layer storage(60) to the nozzles through supply lines(70,170).