SEMICONDUCTOR MULTI CHAMBER EQUIPMENT

摘要

PURPOSE: Semiconductor multi chamber equipment is provided to reduce an interval of maintenance for a corresponding chamber wherein a leakage occurs by installing a dual slot valve between each process chamber/loader chamber and a transfer chamber. CONSTITUTION: One lot of wafers are loaded into at least one loader chamber(100). A corresponding process is performed on the individual wafer in at least one process chamber(110). The transfer chamber(120) includes a transfer module(122) for transferring the wafer to the loader chamber and the process chamber, positioned between the loader chamber and the process chamber. Each loader chamber and process chamber are separated from the transfer chamber by two slot valves(212,213).