| 发明名称 |
METHOD FOR THE DEPOSITION OF TRANSPARENT CONDUCTING LAYERS BY MEANS OF SPUTTER GAS COMPRISING HELIUM |
| 摘要 |
The invention relates to a method for the deposition of transparent conducting layers made of oxides of the elements Sn, Zn, In and Ce by means of magnetron sputtering, whereby a proportion of helium of from 5 to 50 vol. % is added to the working gas used to form the plasma. |
| 申请公布号 |
WO03104518(A1) |
申请公布日期 |
2003.12.18 |
| 申请号 |
WO2003EP03346 |
申请日期 |
2003.03.31 |
| 申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E. V.;EGEL, MANUELA;GOEDICKE, KLAUS;WINKLER, TORSTEN |
发明人 |
EGEL, MANUELA;GOEDICKE, KLAUS;WINKLER, TORSTEN |
| 分类号 |
C23C14/08;C23C14/35;(IPC1-7):C23C14/08;H01J37/34 |
主分类号 |
C23C14/08 |
| 代理机构 |
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