发明名称 |
Layer formation method, and substrate with a layer formed by the method |
摘要 |
A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency omega2 of the second high frequency electric field is higher than frequency omega1 of the first high frequency electric field, strength V1 of the first high frequency electric field, strength V2 of the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V1>=IV>V2 or V1>IV>=V2, and power density of the second high frequency electric field is not less than 1 W/cm<2>. |
申请公布号 |
US2003232136(A1) |
申请公布日期 |
2003.12.18 |
申请号 |
US20030378695 |
申请日期 |
2003.03.04 |
申请人 |
FUKUDA KAZUHIRO;MOROHOSHI YASUO;NISHIWAKI AKIRA;KONDO YOSHIKAZU;TODA YOSHIRO;OISHI KIYOSHI |
发明人 |
FUKUDA KAZUHIRO;MOROHOSHI YASUO;NISHIWAKI AKIRA;KONDO YOSHIKAZU;TODA YOSHIRO;OISHI KIYOSHI |
分类号 |
C23C16/453;C23C16/505;H05H1/24;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/453 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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