Photolithography system for manufacture of electronic circuits uses square contact holes which may be arranged different distances apart to generate different additional structures

摘要

A mask generating layout (30) has two adjacent square holes (32a,32b) a given distance (D) apart. Masks (36,38) are formed with straight additional structures (34a,34b) surrounding the square holes. The pattern obtained varies according to the distance apart of the square holes. When D is large - no coupling - two separate patterns are produced on the same mask. With a medium value of D - weak coupling - the two patterns share one of the additional structures. When D is small - strong coupling - separate patterns are produced on separate masks.