发明名称 Etching system and etching method
摘要 An etching system for subjecting a single film to be etched to etching comprised of a plurality of etching steps applying respective different recipes. The etching system comprises a recipe generating means which fixes the recipe to be applied to the final etching step affecting an underlying film making contact with the film to be etched, of the etching steps, to a preset recipe and which generates a recipe to be applied to the residual etching step on the basis of the results of processing, and etching processing is conducted according to the recipes generated by the recipe generating means.
申请公布号 US2003230551(A1) 申请公布日期 2003.12.18
申请号 US20020224652 申请日期 2002.08.21
申请人 KAGOSHIMA AKIRA;YOSHIGAI MOTOHIKO;YAMAMOTO HIDEYUKI;SHIRAISHI DAISUKE;TANAKA JUNICHI;TAMAKI KENJI;MORIOKA NATSUYO 发明人 KAGOSHIMA AKIRA;YOSHIGAI MOTOHIKO;YAMAMOTO HIDEYUKI;SHIRAISHI DAISUKE;TANAKA JUNICHI;TAMAKI KENJI;MORIOKA NATSUYO
分类号 H01L21/3065;H01L21/00;H01L21/3213;H01L21/66;(IPC1-7):C23F1/00;H01L21/306 主分类号 H01L21/3065
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