发明名称 |
ZNS-SIO 2 SPUTTERING TARGET AND OPTICAL RECORDING MEDIUM HAVING ZNS-SIO 2 PHASE-CHANGE TYPE OPTICAL DISC PROTECTIVE FILM FORMED THROUGH USE OF THAT TARGET |
摘要 |
The present invention relates to a ZnS-SiO2 sputtering target having a relative density of 90% or more characterized in being sintered with powder wherein 1 to 50mol% of SiO2 glass powder containing, as an additive, a total of 0.01 to 20wt% of one or more types selected from a metal element, boron, phosphorus, arsenic or the oxides thereof, and the remnant ZnS powder are evenly dispersed and mixed. By enabling the stable manufacture of a target at low cost and in which the SiO2 crystal grain is minute and of a high density of 90% or more, obtained is a sputtering target for forming an optical disc protective film capable of further improving the evenness of deposition and increasing the productivity rate, and an optical recording medium having formed thereon a ZnS-SiO2 phase change optical disc protective film upon employing the ZnS-SiO2 sputtering target. <IMAGE>
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申请公布号 |
EP1371747(A1) |
申请公布日期 |
2003.12.17 |
申请号 |
EP20010273953 |
申请日期 |
2001.11.30 |
申请人 |
NIKKO MATERIALS COMPANY, LIMITED |
发明人 |
YAHAGI, MASATAKA;TAKAMI, HIDEO |
分类号 |
C04B35/547;C23C14/06;C23C14/34;G11B7/254;G11B7/257;G11B7/26;(IPC1-7):C23C14/34;G11B7/24 |
主分类号 |
C04B35/547 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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