发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
<p>A linear seal 100 seals over a slot 112 formed in a wall 110 of a vacuum chamber VC of a lithographic projection apparatus. The linear seal 100 comprises an elongate sealing member 120 which is locally displaced from the slot 112 at a selectable position 125 such that conduits 140 may pass from outside of the vacuum chamber VC to the inside of the vacuum chamber VC at the local displacement of the elongate sealing member 120.</p> |
申请公布号 |
EP1372039(A2) |
申请公布日期 |
2003.12.17 |
申请号 |
EP20030253696 |
申请日期 |
2003.06.11 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VOSTERS, PETRUS MATTHIJS HENRICUS;JACOBS, HERNES;VAN DER SCHOOT, HARMEN KLAAS;RUTGERS, PETER |
分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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