Control of an apparatus for exposing a semiconductor device

摘要

A semiconductor exposure apparatus including a measuring unit 201 which measures the height information of a wafer 3 and an adjustment unit 203 which adjusts the position of a mask 1 in its direction of height and that of the wafer 3 in its direction of height on the basis of the height information of the wafer 3 in the preceding exposure steps and that in the current exposure step.