发明名称 Apparatus for applying a semiconductor chip to a carrier element with a compensating layer
摘要 A method and an apparatus are described for applying an integrated circuit to a carrier element. In which a curable compensating layer of initially paste-like consistency is coated substantially with full coverage onto a lower contact area of the integrated circuit. Whereupon the integrated circuit is joined together, by the compensating layer, with the carrier element after a relative alignment in order then to produce an electrical connection between the integrated circuit and conductor tracks of the carrier element via electrical lines surmounting the thickness of the compensating layer. Whereupon the compensating layer is cured resulting in an increased volume of the compensating layer.
申请公布号 US6664648(B2) 申请公布日期 2003.12.16
申请号 US20010809860 申请日期 2001.03.16
申请人 INFINEON TECHNOLOGIES AG 发明人 WINDERL JOHANN;HAUSER CHRISTIAN;REISS MARTIN
分类号 H01L21/56;H01L21/60;(IPC1-7):H01L23/29 主分类号 H01L21/56
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